[Read and download] Advances in Rapid Thermal and Integrated Processing (Nato Science Series E:)
| #9145751 in Books | 2010-12-03 | Original language:English | PDF # 1 | 9.25 x1.31 x6.10l,1.77 | File Name: 9048146968 | 566 pages
Rapid thermal and integrated processing is an emerging single-wafer technology in ULSI semiconductor manufacturing, electrical engineering, applied physics and materials science. Here, the physics and engineering of this technology are discussed at the graduate level. Three interrelated areas are covered. First, the thermophysics of photon-induced annealing of semiconductor and related materials, including fundamental pyrometry and emissivity issues, the modelling of re...
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