[Read ebook] Chemical Vapour Deposition: Precursors, Processes and Applications
| #1995945 in Books | Royal Society of Chemistry | 2009-01-21 | Original language:English | PDF # 1 | 9.69 x1.50 x7.44l,2.95 | File Name: 0854044655 | 600 pages |
|||"...Timely and welcome...comprehensive, well-presented and refreshingly readable."...this book will be very useful to a broad readership, including chemists, engineers and students." (Chemistry and Industry, John Colligon, Manchester Met University.)
Chemical Vapour Deposition (CVD) involves the deposition of thin solid films from chemical precursors in the vapour phase, and encompasses a variety of deposition techniques, including a range of thermal processes, plasma enhanced CVD (PECVD), photon- initiated CVD, and atomic layer deposition (ALD). The development of CVD technology owes a great deal to collaboration between different scientific disciplines such as chemistry, physics, materials science, engineering and...
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